Nova has announced a major achievement with the selection of its Nova Metrion® platform by one of the world’s leading memory manufacturers. The platform will be used in the manufacturer’s advanced DRAM R&D as well as high-volume DRAM and NAND manufacturing lines. Nova anticipates receiving further orders from this customer as they expand their inline metrology capabilities.
The Nova Metrion platform enhances process control and improves yield by enabling inline SIMS (Secondary Ion Mass Spectrometry) measurements of material composition depth profiles in next-generation devices. It was chosen for its ability to conduct full-wafer measurements of epitaxial layers with exceptional sensitivity and precision.
The breakthrough technology of Nova Metrion facilitates advanced process control for complex multilayer films. Designed specifically for high-volume manufacturing environments, it provides quantitative, actionable results with high-depth resolution.
One of the unique features of the Metrion platform is its in-line composition profiling capability, which is essential for measuring dopant concentration, contamination, residues, and diffusion—measurements not achievable through other techniques.
“Bridging the gap between laboratory and fabrication environments is crucial for enabling next-generation device manufacturing,” said Gaby Waisman, President and CEO of Nova. “The Nova Metrion addresses the growing need for materials process control in advanced memory and logic devices.”
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